US Patent Issued to ASML NETHERLANDS on May 13 for "Method of manufacturing a pellicle for a lithographic apparatus, a pellicle for a lithographic apparatus, a lithographic apparatus, a device manufacturing method, an apparatus for processing a pellicle, and a method for processing a pellicle" (Dutch Inventors)

ALEXANDRIA, Va., June 12 -- United States Patent no. 12,298,663, issued on May 13, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Method of manufacturing a pellicle for a lithographic apparatus, a pellicle for a lithographic apparatus, a lithographic apparatus, a device manufacturing method, an apparatus for processing a pellicle, and a method for processing a pellicle" was invented by Maria Peter (Eindhoven, Netherlands), Erik Achilles Abegg (Eindhoven, Netherlands), Adrianus Johannes Maria Giesbers (Vlijmen, Netherlands), Johan Hendrik Klootwijk (Eindhoven, Netherlands), Maxim Aleksandrovich Nasalevich (Eindhoven, Netherlands), Wilhelmus Theodorus Anthonius Johannes Van Den Einden (Deurne, Netherlands), Willem Joan Van ...