US Patent Issued to ASML Netherlands on March 4 for "Target for measuring a parameter of a lithographic process" (Dutch Inventors)

ALEXANDRIA, Va., March 5 -- United States Patent no. 12,242,203, issued on March 4, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Target for measuring a parameter of a lithographic process" was invented by Maurits Van Der Schaar (Eindhoven, Netherlands), Patrick Warnaar (Tilburg, Netherlands), Franciscus Godefridus Casper Bijnen (Valkenswaard, Netherlands) and Olger Victor Zwier (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is target arrangement comprising a first target region having at least a first pitch and at least a second pitch a second target region having at least a third pitch, wherein a portion of the first target region having a second pitch o...