US Patent Issued to ASML NETHERLANDS on March 4 for "Substrate support, lithographic apparatus, method for manipulating charge distribution and method for preparing a substrate" (Dutch Inventors)

ALEXANDRIA, Va., March 5 -- United States Patent no. 12,242,204, issued on March 4, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Substrate support, lithographic apparatus, method for manipulating charge distribution and method for preparing a substrate" was invented by Ruud Antonius Catharina Maria Beerens (Roggel, Netherlands), Koen Gerhardus Winkels (Schijndel, Netherlands), Dirk Willem Harberts (Eindhoven, Netherlands), Lucas Henricus Johannes Stevens (Eindhoven, Netherlands), Dennis Dominic Van Der Voort (Best, Netherlands), Edwin Johannes Cornelis Bos (Dommelen, Netherlands), George Alois Leonie Leenknegt (Waalre, Netherlands) and Nicolaas Ten Kate (Almkerk, Netherlands).

According to the abstract* released by the...