US Patent Issued to ASML NETHERLANDS on March 4 for "Lithography apparatus and a method of manufacturing a device" (Dutch, Belgian Inventors)

ALEXANDRIA, Va., March 5 -- United States Patent no. 12,242,200, issued on March 4, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Lithography apparatus and a method of manufacturing a device" was invented by Erik Henricus Egidius Catharina Eummelen (Veldhoven, Netherlands), Frank Debougnoux (Voeren, Belgium), Koen Cuypers (Lommel, Belgium), Han Henricus Aldegonda Lempens (Weert, Netherlands), Theodorus Wilhelmus Polet (Geldrop, Netherlands), Jorge Alberto Vieyra Salas (Eindhoven, Netherlands), John Maria Bombeeck (Eindhoven, Netherlands), Johannes Cornelis Paulus Melman (Oisterwijk, Netherlands) and Giovanni Luca Gattobigio (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Offi...