US Patent Issued to ASML Netherlands on March 4 for "Apparatus using multiple charged particle beams" (California Inventors)

ALEXANDRIA, Va., March 5 -- United States Patent no. 12,243,709, issued on March 4, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Apparatus using multiple charged particle beams" was invented by Weiming Ren (San Jose, Calif.), Xuedong Liu (San Jose, Calif.), Xuerang Hu (San Jose, Calif.) and Zhong-Wei Chen (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure proposes an anti-rotation lens and using it as an anti-rotation condenser lens in a multi-beam apparatus with a pre-beamlet-forming mechanism. The anti-rotation condenser lens keeps rotation angles of beamlets unchanged when changing currents thereof, and thereby enabling the pre-beamlet-forming mecha...