ALEXANDRIA, Va., March 26 -- United States Patent no. 12,259,546, issued on March 25, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).
"Micromirror arrays" was invented by Alexandre Halbach (Leuven, Belgium), Nitesh Pandey (Eindhoven, Netherlands), Sebastianus Adrianus Goorden (Eindhoven, Netherlands), Veronique Rochus (Leuven, Belgium), Luc Roger Simonne Haspeslagh (Linden, Belgium) and Guilherme Brondani Torri (Leuven, Belgium).
According to the abstract* released by the U.S. Patent & Trademark Office: "A micromirror array includes a substrate, a plurality of mirrors for reflecting incident radiation, and for each mirror of the plurality of mirrors, a respective post connecting the substrate to the respective mirror. The ...