ALEXANDRIA, Va., March 26 -- United States Patent no. 12,259,664, issued on March 25, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).
"Method of designing an alignment mark" was invented by Jigang Ma (Veldhoven, Netherlands) and Hua Li (Eindhoven, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of configuring a mark having a trench to be etched into a substrate, the method including: obtaining a relation between an extent of height variation across a surface of a probationary layer deposited on a probationary trench of a probationary depth and a thickness of the probationary layer; determining an extent of height variation across the surface of a layer deposited on the mar...