US Patent Issued to ASML Netherlands on March 18 for "Numerically compensating SEM-induced charging using diffusion-based model" (Canadian, Dutch Inventors)

ALEXANDRIA, Va., March 19 -- United States Patent no. 12,255,042, issued on March 18, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Numerically compensating SEM-induced charging using diffusion-based model" was invented by Thomas Jarik Huisman (Eindhoven, Netherlands) and Shakeeb Bin Hasan (Montreal).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems and methods for image enhancement are disclosed. A method for enhancing an image may include acquiring a scanning electron microscopy (SEM) image. The method may also include simulating diffused charge associated with a position of the SEM image. The method may further include providing an enhanced SEM image based on the SEM image and the d...