ALEXANDRIA, Va., June 4 -- United States Patent no. 12,322,569, issued on June 3, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Method and system for fabricating unique chips using a charged particle multi-beamlet lithography system" was invented by Marcel Nicolaas Jacobus van Kervinck (Monster, Netherlands) and Vincent Sylvester Kuiper (The Hague, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of creating electronic devices such as semiconductor chips using a maskless lithographic exposure system such as a charged particle multi-beamlet lithography system (301A-301D). The maskless lithographic exposure system comprises a lithography subsystem (316) including a maskles...