ALEXANDRIA, Va., June 25 -- United States Patent no. 12,339,594, issued on June 24, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).
"Substrate level sensing in a lithographic apparatus" was invented by Martin Jules Marie-Emile De Nivelle (Waalre, Netherlands), Jori Selen (Eindhoven, Netherlands), Marcel Bontekoe (Neerpelt, Belgium) and Doru Cristian Torumba (Veldhoven, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "A lithographic apparatus is disclosed. The lithographic apparatus comprises a substrate table configured to support a substrate; actuators configurable to move the substrate table in a plane substantially parallel to the surface of the substrate; a projection system con...