US Patent Issued to ASML NETHERLANDS on June 24 for "Determining metrics for a portion of a pattern on a substrate" (Chinese, American Inventors)

ALEXANDRIA, Va., June 25 -- United States Patent no. 12,339,591, issued on June 24, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Determining metrics for a portion of a pattern on a substrate" was invented by Jiao Huang (Shenzhen, China), Yunan Zheng (Fremont, Calif.), Qian Zhao (San Jose, Calif.), Jiao Liang (San Jose, Calif.), Yongfa Fan (Sunnyvale, Calif.) and Mu Feng (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems and methods for determining one or more characteristic metrics for a portion of a pattern on a substrate are described. Pattern information for the pattern on the substrate is received. The pattern on the substrate has first and second portions. The f...