ALEXANDRIA, Va., June 18 -- United States Patent no. 12,326,428, issued on June 10, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).
"Residual gas analyzer" was invented by Reinier Theodorus Martinus Jilisen (Eindhoven, Netherlands), Maarten Jan Heerkens (Waalre, Netherlands), Hendrikus Petrus Kluijtmans (Asten, Netherlands), Robbert Willem Frederik Oosterbaan (Valkenswaard, Netherlands) and Antonius Marinus Coenraad Petrus Leonardus Van De Kerkhof (Handel, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed herein is a residual gas analyser for detecting gas in a vacuum tool, the residual gas analyser comprising: one or more ion sources configured to ionise a gas in the resid...