ALEXANDRIA, Va., June 18 -- United States Patent no. 12,326,407, issued on June 10, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).
"Inspection apparatus and inspection method" was invented by Nitish Kumar (Eindhoven, Netherlands), Richard Quintanilha (Heidenheim an der Brenz, Germany), Markus Gerardus Martinus Maria Van Kraaij (Eindhoven, Netherlands), Konstantin Tsigutkin (Eindhoven, Netherlands) and Willem Marie Julia Marcel Coene (Geldrop, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of inspection for defects on a substrate, such as a reflective reticle substrate, and associated apparatuses. The method includes performing the inspection using inspection radiation ob...