ALEXANDRIA, Va., June 18 -- United States Patent no. 12,326,669, issued on June 10, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).
"Illumination apparatus and associated metrology and lithographic apparatuses" was invented by Simon Reinald Huisman (Eindhoven, Netherlands), Arjan Johannes Anton Beukman (Son en Breugel, Netherlands), Arie Jeffrey Den Boef (Waalre, Netherlands), Sebastianus Adrianus Goorden (Eindhoven, Netherlands), Nitish Kumar (Eindhoven, Netherlands), Jin Lian (Eindhoven, Netherlands) and Zili Zhou (Veldhoven, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is an illumination arrangement for spectrally shaping a broadband illumination beam to obtain a sp...