US Patent Issued to ASML Netherlands on June 10 for "Charged particle blocking element, exposure apparatus comprising such an element, and method for using such an exposure apparatus" (Dutch Inventors)

ALEXANDRIA, Va., June 18 -- United States Patent no. 12,327,707, issued on June 10, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Charged particle blocking element, exposure apparatus comprising such an element, and method for using such an exposure apparatus" was invented by Alexander Hendrik Vincent Van Veen (Delft, Netherlands) and Derk Ferdinand Walvoort (Delft, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention relates to an exposure apparatus and a method for projecting a charged particle beam onto a target. The exposure apparatus comprises a charged particle optical arrangement comprising a charged particle source for generating a charged particle beam and a ch...