ALEXANDRIA, Va., July 9 -- United States Patent no. 12,354,891, issued on July 8, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).
"Particle beam inspection apparatus" was invented by Jeroen Gerard Gosen (Westport, Conn.), Te-Yu Chen (San Jose, Calif.), Dennis Herman Caspar Van Banning (Best, Netherlands), Edwin Cornelis Kadijk (Eindhoven, Netherlands), Martijn Petrus Christianus Van Heumen (Santa Clara, Calif.), Erheng Wang (San Jose, Calif.) and Johannes Andreas Henricus Maria Jacobs (Veldhoven, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock ...