US Patent Issued to ASML Netherlands on July 8 for "Multiple landing energy scanning electron microscopy systems and methods" (California Inventors)

ALEXANDRIA, Va., July 9 -- United States Patent no. 12,354,833, issued on July 8, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Multiple landing energy scanning electron microscopy systems and methods" was invented by Wei Fang (Milpitas, Calif.), Weiming Ren (San Jose, Calif.) and Zhong-wei Chen (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Inspection systems and methods are disclosed. An inspection system may include a first energy source configured to provide a first landing energy beam and a second energy source configured to provide a second landing energy beam. The inspection system may also include a beam controller configured to selectively deliver one of the firs...