ALEXANDRIA, Va., July 30 -- United States Patent no. 12,372,888, issued on July 29, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).
"Patterning device conditioning system and method" was invented by Marcus Adrianus Van De Kerkhof (Helmond, Netherlands), Ferdinandus Martinus Jozef Henricus Van De Wetering (Eindhoven, Netherlands) and Andrei Mikhailovich Yakunin (Veldhoven, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "A reticle conditioning system includes: a support structure to support a reticle; a gas supply module to provide a flow of gas adjacent to the reticle; and a biasing module to control an electrical potential of the reticle. The biasing module includes a first electro...