US Patent Issued to ASML Netherlands on July 29 for "In-lens wafer PE-charging and inspection with multiple beams" (California Inventors)

ALEXANDRIA, Va., July 30 -- United States Patent no. 12,374,524, issued on July 29, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"In-lens wafer PE-charging and inspection with multiple beams" was invented by Weihua Yin (Santa Clara, Calif.) and Youfei Jiang (Milpitas, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A charged particle system may include a first charged particle beam source provided on a first axis, and a second charged particle beam source provided on a second axis. There may also be provided a deflector arranged on the first axis. The deflector may be configured to deflect a beam generated from the second charged particle beam source toward a sample. A method of oper...