US Patent Issued to ASML NETHERLANDS on July 22 for "Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder" (Dutch Inventors)

ALEXANDRIA, Va., July 23 -- United States Patent no. 12,366,808, issued on July 22, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder" was invented by Raymond Wilhelmus Louis Lafarre (Helmond, Netherlands), Sjoerd Nicolaas Lambertus Donders (Vught, Netherlands), Nicolaas Ten Kate (Almkerk, Netherlands), Nina Vladimirovna Dziomkina (Eindhoven, Netherlands), Yogesh Pramod Karade (Eindhoven, Netherlands) and Elisabeth Corinne Rodenburg (Heeze, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate holder for a lithographic apparatus has a main body having a thin-fi...