US Patent Issued to ASML Netherlands on July 22 for "Metrology system and method for determining a characteristic of one or more structures on a substrate" (Dutch Inventors)

ALEXANDRIA, Va., July 23 -- United States Patent no. 12,366,811, issued on July 22, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Metrology system and method for determining a characteristic of one or more structures on a substrate" was invented by Patricius Aloysius Jacobus Tinnemans (Hapert, Netherlands), Arie Jeffrey Den Boef (Waalre, Netherlands), Armand Eugene Albert Koolen (Nuth, Netherlands), Nitesh Pandey (Eindhoven, Netherlands), Vasco Tomas Tenner (Amsterdam), Willem Marie Julia Marcel Coene (Geldrop, Netherlands) and Patrick Warnaar (Tilburg, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Described is a metrology system for determining a characteristic of interest re...