US Patent Issued to ASML NETHERLANDS on July 22 for "Methods and apparatus for controlling a lithographic process" (Dutch, Belgian Inventors)

ALEXANDRIA, Va., July 23 -- United States Patent no. 12,366,809, issued on July 22, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Methods and apparatus for controlling a lithographic process" was invented by Roy Werkman (Eindhoven, Netherlands), David Frans Simon Deckers (Turnhout, Belgium), Bijoy Rajasekharan (Eindhoven, Netherlands), Ignacio Salvador Vazquez Rodarte (Eindhoven, Netherlands) and Sarathi Roy (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of determining a control parameter for a lithographic process is disclosed, the method includes: defining a substrate model for representing a process parameter fingerprint across a substrate, the substrate...