US Patent Issued to ASML NETHERLANDS on July 22 for "Measuring apparatus and method for roughness and/or defect measurement on a surface" (German Inventors)

ALEXANDRIA, Va., July 23 -- United States Patent no. 12,366,445, issued on July 22, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Measuring apparatus and method for roughness and/or defect measurement on a surface" was invented by Alexander Von Finck (Berlin), Simon Halm (Berlin), Ingo Juergen Markel (Dresden, Germany) and Maciej Neumann-Robisch (Berlin).

According to the abstract* released by the U.S. Patent & Trademark Office: "A measuring apparatus has at least two radiation sources arranged to illuminate a measuring region of a surface of a sample, the at least two sources configured to illuminate the measuring region along at least two illumination beam paths at different angles of incidence relative to a surface n...