US Patent Issued to ASML Netherlands on July 15 for "EUV radiation system including maximizing droplet velocity change transverse to main pulse propagation" (Dutch Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,363,818, issued on July 15, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"EUV radiation system including maximizing droplet velocity change transverse to main pulse propagation" was invented by Gijs Dingemans (Eindhoven, Netherlands), Colm O'Gorman (Eindhoven, Netherlands) and Ruben Haverkort (Valkenswaard, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A radiation system configured to produce radiation and comprising a droplet generator (3) configured to produce a droplet of fuel traveling towards a plasma formation region, a laser system operative to generate a pre-pulse (PP) and a main pulse (MP), wherein the pre-pulse ...