ALEXANDRIA, Va., July 3 -- United States Patent no. 12,346,032, issued on July 1, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).
"System, lithographic apparatus and method" was invented by Rob Johan Theodoor Rutten (Heeze, Netherlands), Ruud Hendrikus Martinus Johannes Bloks (Helmond, Netherlands), Alexandrios Mathew (San Diego) and Ron Vennix (Bladel, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "A system for measuring a beam. The system includes a measurement device configured to measure the beam and determine a signal based on the measured beam, and a fluid supply device configured to provide fluid as a fluid stream to, or surrounding, the beam. The system is configured to ca...