US Patent Issued to ASML Netherlands on July 1 for "Multiple charged-particle beam apparatus and methods of operating the same using movable lenses" (California Inventors)

ALEXANDRIA, Va., July 3 -- United States Patent no. 12,347,643, issued on July 1, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Multiple charged-particle beam apparatus and methods of operating the same using movable lenses" was invented by Weiming Ren (San Jose, Calif.), Xuedong Liu (San Jose, Calif.), Xuerang Hu (San Jose, Calif.) and Zhong-wei Chen (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems and methods of reducing the Coulomb interaction effects in a charged particle beam apparatus are disclosed. The charged particle beam apparatus may comprise a charged particle source and a source conversion unit comprising an aperture-lens forming electrode plate configu...