US Patent Issued to ASML Netherlands on July 1 for "Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method" (Dutch Inventors)

ALEXANDRIA, Va., July 3 -- United States Patent no. 12,346,031, issued on July 1, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method" was invented by Fei Liu (Eindhoven, Netherlands), Jin Lian (Eindhoven, Netherlands), Zhuangxiong Huang (Eindhoven, Netherlands), Laurentius Cornelius De Winter (Vessem, Netherlands) and Frank Staals (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a method for focus measurement of a lithographic process. The method comprises receiving a substrate on which a metrology pattern has been printed wit...