US Patent Issued to ASML Netherlands on Jan. 28 for "Multiple charged-particle beam apparatus with low crosstalk" (California Inventors)

ALEXANDRIA, Va., Jan. 29 -- United States Patent no. 12,211,669, issued on Jan. 28, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Multiple charged-particle beam apparatus with low crosstalk" was invented by Weiming Ren (San Jose, Calif.), Zizhou Gong (San Jose, Calif.), Xuerang Hu (San Jose, Calif.), Xuedong Liu (San Jose, Calif.) and Zhong-wei Chen (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems and methods of forming images of a sample using a multi-beam apparatus are disclosed. The method may include generating a plurality of secondary electron beams from a plurality of probe spots on the sample upon interaction with a plurality of primary electron beams. The me...