ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,535,746, issued on Jan. 27, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).
"Lithographic apparatus stage coupling" was invented by Johannes Petrus Martinus Bernardus Vermeulen (Leende, Netherlands), Johannes Adrianus Leonardus De Goeij (Utrecht, Netherlands), Rene Wilhelmus Antonius Hubertus Leenaars (Eindhoven, Netherlands), Bas Jansen (Rosmalen, Netherlands) and Ron Geeraard Catharina De Bruijn (Arendonk, Belgium).
According to the abstract* released by the U.S. Patent & Trademark Office: "A coupling having a variable stiffness is disclosed. The coupling includes: a deformable component and a support being movably arranged with respect to each other, wherein the de...