US Patent Issued to ASML Netherlands on Feb. 4 for "Systems and methods for thermally conditioning a wafer in a charged particle beam apparatus" (Dutch, American Inventors)

ALEXANDRIA, Va., Feb. 5 -- United States Patent no. 12,217,930, issued on Feb. 4, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Systems and methods for thermally conditioning a wafer in a charged particle beam apparatus" was invented by Martijn Petrus Christianus Van Heumen (Santa Clara, Calif.) and Jeroen Gerard Gosen (Veldhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including a thermal conditioning station for preconditioning a temperature of a wafer is disclosed. The charged particle beam apparatus may scan the wafer to measure one or more characteristics of t...