US Patent Issued to ASML Netherlands on Feb. 4 for "Beam manipulation of advanced charge controller module in a charged particle system" (California Inventors)

ALEXANDRIA, Va., Feb. 5 -- United States Patent no. 12,217,927, issued on Feb. 4, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Beam manipulation of advanced charge controller module in a charged particle system" was invented by Jian Zhang (San Jose, Calif.), Ning Ye (San Jose, Calif.), Zhiwen Kang (San Jose, Calif.) and Yixiang Wang (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system and a method for manipulating a beam of an Advanced Charge Controller module in different planes in an e-beam system are provided. Some embodiments of the system include a lens system configured to manipulate a beam in the tangential plane and the sagittal plane such that the beam spot i...