US Patent Issued to ASML NETHERLANDS on Feb. 3 for "Lithographic apparatus substrate table and method of loading a substrate" (Dutch Inventors)

ALEXANDRIA, Va., Feb. 3 -- United States Patent no. RE50,785, issued on Feb. 3, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Lithographic apparatus substrate table and method of loading a substrate" was invented by Mahdiar Valefi (Eindhoven, Netherlands) and Raymond Wilhelmus Louis Lafarre (Helmond, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A lithographic apparatus substrate table comprises a plurality of first projections, whereby the first projections define a first substrate supporting plane and a plurality of second projections, whereby the second projections define a second substrate supporting plane. The substrate table further comprises a clamping device configured...