US Patent Issued to ASML NETHERLANDS on Feb. 18 for "Selection of measurement locations for patterning processes" (Dutch, American Inventors)

ALEXANDRIA, Va., Feb. 19 -- United States Patent no. 12,228,862, issued on Feb. 18, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Selection of measurement locations for patterning processes" was invented by Hans Van Der Laan (Veldhoven, Netherlands), Wim Tjibbo Tel (Helmond, Netherlands), Marinus Jochemsen (Sunnyvale, Calif.) and Stefan Hunsche (Santa Clara, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A process of selecting a measurement location, the process including: obtaining pattern data describing a pattern to be applied to substrates in a patterning process; obtaining a process characteristic measured during or following processing of a substrate, the process characteristi...