US Patent Issued to ASML Netherlands on Feb. 18 for "Fully automated SEM sampling system for e-beam image enhancement" (California Inventors)

ALEXANDRIA, Va., Feb. 19 -- United States Patent no. 12,230,013, issued on Feb. 18, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Fully automated SEM sampling system for e-beam image enhancement" was invented by Wentian Zhou (San Jose, Calif.), Liangjiang Yu (San Jose, Calif.), Teng Wang (San Jose, Calif.), Lingling Pu (San Jose, Calif.) and Wei Fang (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed herein is a method of automatically obtaining training images to train a machine learning model that improves image quality. The method may comprise analyzing a plurality of patterns of data relating to a layout of a product to identify a plurality of training locations...