US Patent Issued to ASML Netherlands on Feb. 18 for "Apparatus for and method of local control of a charged particle beam" (Dutch Inventors)

ALEXANDRIA, Va., Feb. 19 -- United States Patent no. 12,230,469, issued on Feb. 18, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Apparatus for and method of local control of a charged particle beam" was invented by Albertus Victor Gerardus Mangnus (Eindhoven, Netherlands) and Maikel Robert Goosen (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed among other aspects is a charged particle inspection system including a phaseplate configured and arranged to modify the local phase of charged particles in a beam to reduce the effects of lens aberrations. The phaseplate is made up of an array of apertures with the voltage and/or a degree of obscuration of the apert...