US Patent Issued to ASML NETHERLANDS on Dec. 9 for "Method for optimizing a sampling scheme and associated apparatuses" (Dutch, German Inventors)

ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,493,248, issued on Dec. 9, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Method for optimizing a sampling scheme and associated apparatuses" was invented by Sarathi Roy (Eindhoven, Netherlands), Wolfgang Helmut Henke (Kempen, Germany) and Peter Ten Berge (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method and associated apparatuses for optimizing a sampling scheme which defines sampling locations on a bonded substrate, having undergone a wafer to wafer bonding process. The method includes determining a sampling scheme for a metrology process and optimizing the sampling scheme with respect to a singularity de...