US Patent Issued to ASML Netherlands on Dec. 9 for "Method and system for predicting process information with a parameterized model" (Dutch Inventors)

ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,493,247, issued on Dec. 9, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Method and system for predicting process information with a parameterized model" was invented by Scott Anderson Middlebrooks (Duizel, Netherlands), Patrick Warnaar (Tilburg, Netherlands), Patrick Philipp Helfenstein (Eindhoven, Netherlands), Alexander Prasetya Konijnenberg (Veldhoven, Netherlands), Maxim Pisarenco (Son en Breugel, Netherlands) and Markus Gerardus Martinus Maria Van Kraaij (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method and system for predicting complex electric field images with a parameterized model are described. ...