ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,493,285, issued on Dec. 9, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).
"Determining a correction to a process" was invented by Sarathi Roy (Eindhoven, Netherlands), Edo Maria Hulsebos (Waalre, Netherlands), Roy Werkman (Eindhoven, Netherlands) and Junru Ruan (Beaverton, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for configuring a semiconductor manufacturing process, the method including: obtaining a first value of a first parameter based on measurements associated with a first operation of a process step in the semiconductor manufacturing process and a first sampling scheme; using a recurrent neural network to determ...