US Patent Issued to ASML NETHERLANDS on Dec. 30 for "Method and apparatus for design of a metrology target" (Dutch, American Inventors)

ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,510,829, issued on Dec. 30, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Method and apparatus for design of a metrology target" was invented by Guangqing Chen (Fremont, Calif.), Wei Liu (Los Altos, Calif.) and Maurits Van Der Schaar (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of metrology target design is described. The method includes determining a sensitivity of a parameter of a metrology target design to a perturbation of a process parameter for forming, or measuring the formation of, the metrology target, and determining a robustness of the metrology target design based on the sum of the sensit...