US Patent Issued to ASML NETHERLANDS on Aug. 26 for "Substrate holder, carrier system comprising a substrate holder and lithographic apparatus" (Dutch, American Inventors)

ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,399,436, issued on Aug. 26, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Substrate holder, carrier system comprising a substrate holder and lithographic apparatus" was invented by Krijn Frederik Bustraan (Eindhoven, Netherlands), Arjan Gijsbertsen (Vught, Netherlands), Paul Van Dongen (Wilton, Conn.) and Ibrahim Acan (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate holder to hold a substrate in a substrate holding position, the substrate holder including: a frame, multiple surface clamping devices arranged on the frame to clamp a substrate at an upper surface thereof, wherein the surface clamping dev...