US Patent Issued to ASML Netherlands on Aug. 26 for "Method of determining a characteristic of a structure, and metrology apparatus" (Dutch Inventors)

ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,399,434, issued on Aug. 26, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Method of determining a characteristic of a structure, and metrology apparatus" was invented by Johannes Fitzgerald De Boer (Amstelveen, Netherlands), Vasco Tomas Tenner (Amsterdam), Arie Jeffrey Den Boef (Waalre, Netherlands) and Christos Messinis (Amsterdam).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and apparatus are disclosed for determining a characteristic of a structure. In one arrangement, the structure is illuminated with first illumination radiation to generate first scattered radiation. A first interference pattern is formed by interference...