US Patent Issued to ASML NETHERLANDS on Aug. 26 for "Method for training machine learning model to determine optical proximity correction for mask" (California Inventors)

ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,399,423, issued on Aug. 26, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Method for training machine learning model to determine optical proximity correction for mask" was invented by Jun Tao (Cupertino, Calif.), Stanislas Hugo Louis Baron (San Jose, Calif.), Jing Su (Fremont, Calif.), Ya Luo (Saratoga, Calif.) and Yu Cao (Saratoga, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Training methods and a mask correction method. One of the methods is for training a machine learning model configured to predict a post optical proximity correction (OPC) image for a mask. The method involves obtaining (i) a pre-OPC image associated wi...