ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,386,273, issued on Aug. 12, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).
"Substrate holder, lithographic apparatus and method" was invented by Andre Schreuder (Eindhoven, Netherlands), Gijs Kramer (Nijmegen, Netherlands) and Ludolf Postma (Nijmegen, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate holder for supporting a substrate, a lithographic apparatus having the substrate holder and a method of supporting the substrate. The substrate holder includes a main body, a plurality of supporting pins, and a plate. The plate is positioned between a surface of the main body and a support surface formed by the pluralit...