ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,387,903, issued on Aug. 12, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).
"Aberration correction in charged particle system" was invented by Alexander Hendrik Vincent Van Veen (Rotterdam, Netherlands), Willem Henk Urbanus (Delft, Netherlands) and Marco Jan-Jaco Wieland (Delft, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "A lens element of a charged particle system comprises an electrode having a central opening. The lens element is configured for functionally cooperating with an aperture array that is located directly adjacent said electrode, wherein the aperture array is configured for blocking 5 part of a charged partic...