US Patent Issued to ASML NETHERLANDS on April 29 for "Stage system, lithographic apparatus, method for positioning and device manufacturing method" (Dutch Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,287,586, issued on April 29, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Stage system, lithographic apparatus, method for positioning and device manufacturing method" was invented by Stef Marten Johan Janssens (Eindhoven, Netherlands), Bert Dirk Scholten (Best, Netherlands), Sjoerd Nicolaas Lambertus Donders (Vught, Netherlands), Teunis Van Dam (Eindhoven, Netherlands), Peter Mark Overschie (Eindhoven, Netherlands), Theresa Mary Spaan-Burke (Eindhoven, Netherlands) and Siegfried Alexander Tromp (Knegsel, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system for positioning, a stage system, a lithographic apparatus, a me...