US Patent Issued to ASML Netherlands on April 29 for "Oxygen-loss resistant top coating for optical elements" (Dutch, American, Chinese Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,287,455, issued on April 29, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Oxygen-loss resistant top coating for optical elements" was invented by Yue Ma (Escondido, Calif.), Marcus Adrianus Van De Kerkhof (Helmond, Netherlands), Qiushi Zhu (Harbin, China), Klaus Martin Hummler (San Diego), Peter Matthew Mayer (San Diego), Kay Hoffmann (San Diego), Andrew David LaForge (Poway, Calif.), Igor Vladimirovich Fomenkov (San Diego) and Daniel John William Brown (San Diego).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is an optical element for a lithographic apparatus. The optical element includes a capping layer that includes oxygen...