US Patent Issued to ASML Netherlands on April 29 for "Method for modeling measurement data over a substrate area and associated apparatuses" (Dutch Inventor)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,287,583, issued on April 29, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Method for modeling measurement data over a substrate area and associated apparatuses" was invented by Edo Maria Hulsebos (Bergeijk, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a method for modeling measurement data over a substrate area and associated apparatus. The method comprises obtaining measurement data relating to a first layout; modeling a second model based on said first layout; evaluating the second model on a second layout, the second layout being more dense than said first layout; and fitting a first model to this second ...