US Patent Issued to ASML NETHERLANDS on April 29 for "Method for controlling a lithographic apparatus and associated apparatuses" (Dutch, Belgian Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,287,582, issued on April 29, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Method for controlling a lithographic apparatus and associated apparatuses" was invented by Frank Staals (Eindhoven, Netherlands) and Simon Hendrik Celine Van Gorp (Oud-Turnhout, Belgium).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for configuring an apparatus for providing structures to a layer on a substrate, the method including: obtaining first data including substrate specific data as measured and/or modeled before the providing of the structures to the layer on the substrate; and determining a configuration of the apparatus for at least two diff...