ALEXANDRIA, Va., June 9 -- United States Patent no. 12,287,580, issued on April 29, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).
"Fluid handling system, method and lithographic apparatus" was invented by Cornelius Maria Rops (Waalre, Netherlands), Christianus Wilhelmus Johannes Berendsen (Eindhoven, Netherlands), Erik Henricus Egidius Catharina Eummelen (Veldhoven, Netherlands) and Dagmar Antoinette Wismeijer (Zeist, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "A lithographic apparatus has a substrate holder configured to hold a substrate and a projection system configured to project a radiation beam onto the substrate held by the substrate holder. There is also a fluid handl...