ALEXANDRIA, Va., June 6 -- United States Patent no. 12,282,263, issued on April 22, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).
"Metrology system and lithographic system" was invented by Simon Reinald Huisman (Eindhoven, Netherlands) and Sebastianus Adrianus Goorden (Eindhoven, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a metrology system comprising: a pre-alignment metrology tool operable to measure a plurality of targets on a substrate to obtain measurement data; and a processing unit. The processing unit is operable to: process said measurement data to determine for each target at least one position distribution which describes variation of said position va...